Growth technology for ZnSe single crystals with low dislocation density
Закрыть
Conţinutul numărului revistei
Articolul precedent
Articolul urmator
739 4
Ultima descărcare din IBN:
2022-02-23 12:00
SM ISO690:2012
KOLIBABA, Gleb, NEDEOGLO, Dumitru. Growth technology for ZnSe single crystals with low dislocation density. In: Moldavian Journal of the Physical Sciences, 2008, nr. 1(7), pp. 26-31. ISSN 1810-648X.
EXPORT metadate:
Google Scholar
Crossref
CERIF

DataCite
Dublin Core
Moldavian Journal of the Physical Sciences
Numărul 1(7) / 2008 / ISSN 1810-648X /ISSNe 2537-6365

Growth technology for ZnSe single crystals with low dislocation density


Pag. 26-31

Kolibaba Gleb, Nedeoglo Dumitru
 
Moldova State University
 
 
Disponibil în IBN: 17 decembrie 2013


Rezumat

The influence of the growth temperature, undercooling, growth rate as well as growth chamber construction and furnace temperature profile on the structural perfection of the crystals grown by both physical and chemical vapors transport has been investigated. The conditions for growing of crystals free from subgrain boundaries and twins are suggested. The etch pits are not observed in the basic volume (up to 4 сm ) of grown crystals. It is shown, that PL spectra of as-grown ZnSe crystals consist of the edge radiation only. The resistivity of ZnSe crystals annealed in a Zn melt is higher than 10 Ohm⋅cm, whereas the electrical conductivity of ZnSe:I crystals grown by chemical vapor transport and annealed in a Zn melt is 10 (Ohm⋅cm) at room temperature.